MICROSTRUCTURING OF PHOTOMASKS BY A NON-REACTIVE RADIO-FREQUENCY ION ETCHING

被引：3

作者：

SPANGENBERG, B ^{[1
]}

GORANCHEV, BG ^{[1
]}

ORLINOV, VI ^{[1
]}

JELEV, JG ^{[1
]}

机构：

[1] INST SEMICOND COMPONENTS,BOTEVGRAD,BULGARIA

来源：

关键词：

D O I：

10.1016/0040-6090(82)90285-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：313 / 322

页数：10

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