共 50 条
- [31] DENSITY OF STATES AT SI-SIO2 INTERFACE DETERMINED BY VERY LOW FREQUENCY MEASUREMENTS - RESULTS AND PRECISION COMPTES RENDUS HEBDOMADAIRES DES SEANCES DE L ACADEMIE DES SCIENCES SERIE B, 1970, 270 (08): : 552 - &
- [33] DEFECTS IN SILICON NEAR THE SI-SIO2 INTERFACE PRODUCED BY SI+ IONS IMPLANTATION CRYSTAL LATTICE DEFECTS, 1982, 9 (04): : 189 - 194
- [34] LOW-TEMPERATURE RF PLASMA TREATMENT OF SI-SIO2 STRUCTURES AS A SUBSTITUTION FOR HIGH-TEMPERATURE ANNEALS PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1986, 96 (01): : 363 - 366
- [35] INFLUENCE OF THE LOW-ENERGY ELECTRON-IRRADIATION ON THE FLUCTUATIONAL RELIEF OF THE SI-SIO2 INTERFACE VESTNIK MOSKOVSKOGO UNIVERSITETA SERIYA 3 FIZIKA ASTRONOMIYA, 1989, 30 (02): : 70 - 74
- [39] Effect of low-temperature charge redistributions on the conductivity of surface electron channels at the Si/SiO2 interface Semiconductors, 1999, 33 : 1212 - 1215