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INSTRUMENTATION FOR ELECTRON-BEAM LITHOGRAPHY

被引：10
|
作者：
CHANG, THP [1 ]
机构：
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源：
IEEE TRANSACTIONS ON MAGNETICS | 1974年 / MA10卷 / 03期
关键词：
D O I：
10.1109/TMAG.1974.1058450
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：883 / 887
页数：5
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