INSTRUMENTATION FOR ELECTRON-BEAM LITHOGRAPHY

被引：10

作者：

CHANG, THP ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

关键词：

D O I：

10.1109/TMAG.1974.1058450

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

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页码：883 / 887

页数：5

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