TRADEOFF BETWEEN THRESHOLD VOLTAGE AND BREAKDOWN IN HIGH-VOLTAGE DOUBLE-DIFFUSED MOS-TRANSISTORS

被引:10
|
作者
POCHA, MD [1 ]
PLUMMER, JD [1 ]
MEINDL, JD [1 ]
机构
[1] STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
关键词
D O I
10.1109/T-ED.1978.19273
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1325 / 1327
页数:3
相关论文
共 50 条
  • [31] LOW TO HIGH INJECTIONS IN DOUBLE-DIFFUSED TRANSISTORS
    HUANG, JST
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1968, ED15 (11) : 940 - &
  • [32] Investigations on the high current behavior of lateral diffused high-voltage transistors
    Knaipp, M
    Röhrer, G
    Minixhofer, R
    Seebacher, E
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2004, 51 (10) : 1711 - 1720
  • [33] Analysis of the Influence of Silicon-on-Insulator Lateral Double-Diffused MOS Device Substrate Deep Depletion on the Transient Breakdown Voltage
    Yang, Xiaoming
    Li, Tianqian
    Cao, Taiqiang
    Li, Jianhong
    IEEE ACCESS, 2020, 8 : 151383 - 151391
  • [34] Partial-SOI high voltage laterally double-diffused MOS with a partially buried n+-layer
    Hu Sheng-Dong
    Wu Xing-He
    Zhu Zhi
    Jin Jing-Jing
    Chen Yin-Hui
    CHINESE PHYSICS B, 2014, 23 (06)
  • [35] ERRORS IN THRESHOLD-VOLTAGE MEASUREMENTS OF MOS-TRANSISTORS FOR DOPANT-PROFILE DETERMINATIONS
    CHI, MH
    HU, C
    SOLID-STATE ELECTRONICS, 1981, 24 (04) : 313 - 316
  • [36] Investigations on double-diffused MOS transistors under ESD zap conditions
    Boselli, G
    Meeuwsen, S
    Mouthaan, T
    Kuper, F
    MICROELECTRONICS RELIABILITY, 2001, 41 (03) : 395 - 405
  • [37] Design Issues for Lateral Double-Diffused Metal-Oxide-Semiconductor with Higher Breakdown Voltage
    Sung, Kunsik
    Won, Taeyoung
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2013, 13 (05) : 3260 - 3264
  • [38] Novel trench-etched double-diffused SiC MOS (TED MOS) for overcoming tradeoff between RonA and Qgd
    Tega, Naoki
    Yoshimoto, Hiroyuki
    Hisamoto, Digh
    Watanabe, Naoki
    Shimizu, Haruka
    Sato, Shintaroh
    Mori, Yuki
    Ishigaki, Takashi
    Matsumura, Mieko
    Konishi, Kumiko
    Kobayashi, Keisuke
    Mine, Toshiyuki
    Akiyama, Satoru
    Fujita, Ryusei
    Shima, Akio
    Shimamoto, Yasuhiro
    2015 IEEE 27TH INTERNATIONAL SYMPOSIUM ON POWER SEMICONDUCTOR DEVICES & IC'S (ISPSD), 2015, : 81 - 84
  • [39] Variation of Lateral Width Technique in SoI High-Voltage Lateral Double-Diffused Metal-Oxide-Semiconductor Transistors Using High-k Dielectric
    Guo, Yufeng
    Yao, Jiafei
    Zhang, Bo
    Lin, Hong
    Zhang, Changchun
    IEEE ELECTRON DEVICE LETTERS, 2015, 36 (03) : 262 - 264
  • [40] DOUBLE-DIFFUSED HIGH-SPEED GE TRANSISTORS
    GANSAUGE, P
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1968, ED15 (06) : 438 - &