ABSOLUTE DOSIMETRY OF ION-IMPLANTED IMPURITIES USING A CALORIMETRIC METHOD

被引:4
|
作者
HEMMENT, PLF [1 ]
机构
[1] UNIV SURREY,DEPT ELECTR & ELECT ENGN,GUILDFORD GU2 5XH,SURREY,ENGLAND
关键词
D O I
10.1016/S0042-207X(77)80443-0
中图分类号
T [工业技术];
学科分类号
08 ;
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页码:611 / 616
页数:6
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