ABSOLUTE DOSIMETRY OF ION-IMPLANTED IMPURITIES USING A CALORIMETRIC METHOD

被引：4
|
作者：
HEMMENT, PLF [1 ]
机构：
[1] UNIV SURREY,DEPT ELECTR & ELECT ENGN,GUILDFORD GU2 5XH,SURREY,ENGLAND
来源：
VACUUM | 1977年 / 27卷 / 10-1期
关键词：
D O I：
10.1016/S0042-207X(77)80443-0
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：611 / 616
页数：6
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