QUANTITATIVE-ANALYSIS OF IMPURITIES IN SILICIDE LAYERS WITH SIMS

被引：2

|

作者：

AVAU, D

VANDERVORST, W

MAES, HE

机构：

来源：

FRESENIUS ZEITSCHRIFT FUR ANALYTISCHE CHEMIE | 1987年 / 329卷 / 2-3期

关键词：

D O I：

10.1007/BF00469144

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

引用

收藏

页码：220 / 224

页数：5

相关论文

共 50 条

[21] CELL POKING - QUANTITATIVE-ANALYSIS OF INDENTATION OF THICK VISCOELASTIC LAYERS
DUSZYK, M
SCHWAB, B
ZAHALAK, GI
QIAN, H
ELSON, EL
BIOPHYSICAL JOURNAL, 1989, 55 (04) : 683 - 690
[22] SURFACE, IN-DEPTH, AND QUANTITATIVE-ANALYSIS BY SECONDARY ION MASS-SPECTROMETRY (SIMS)
MORABITO, JM
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01): : 297 - 297
[23] COMPLEMENTARITY OF SIMS AND SEM FOR SUB-MICRON QUANTITATIVE-ANALYSIS OF ALUMINUM-ALLOYS
DEGREVE, F
DERMARKAR, S
DUBUS, A
JOURNAL DE MICROSCOPIE ET DE SPECTROSCOPIE ELECTRONIQUES, 1982, 7 (03): : 243 - 256
[24] QUANTITATIVE-ANALYSIS OF W-C - H COATINGS BY EPMA, RBS (ERD) AND SIMS
WILLICH, P
WANG, M
WTTMAACK, K
MIKROCHIMICA ACTA, 1994, 114 : 525 - 532
[25] QUANTITATIVE-ANALYSIS
NEVIN, JA
JOURNAL OF THE EXPERIMENTAL ANALYSIS OF BEHAVIOR, 1984, 42 (03) : 421 - 434
[26] QUANTITATIVE-ANALYSIS
LUNDSTROM, T
ANNALES DE GEOGRAPHIE, 1976, 85 (470): : 502 - 503
[27] QUANTITATIVE-ANALYSIS
SNYDER, RL
BISH, DL
REVIEWS IN MINERALOGY, 1989, 20 : 101 - 144
[28] QUANTITATIVE-ANALYSIS OF IMPURITIES IN HGCDTE USING SECONDARY ION MASS-SPECTROMETRY
LAPIDES, LE
SURFACE AND INTERFACE ANALYSIS, 1985, 7 (05) : 211 - 216
[29] Characterization of atmospheric impurities in tungsten silicide films by secondary ion mass spectrometry (SIMS).
Mitha, S
Sams, DB
SILICIDE THIN FILMS - FABRICATION, PROPERTIES, AND APPLICATIONS, 1996, 402 : 605 - 609
[30] QUANTITATIVE SIMS ANALYSIS
FURMAN, E
VACUUM, 1983, 33 (04) : 209 - 209

← 1 2 3 4 5 →