BURIED DOPANT AND DEFECT LAYERS FOR DEVICE STRUCTURES WITH HIGH-ENERGY ION-IMPLANTATION

被引：41
|
作者：
CHEUNG, NW
LIANG, CL
LIEW, BK
MUTIKAINEN, RH
WONG, H
机构：
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1989年 / 37-8卷
关键词：
D O I：
10.1016/0168-583X(89)90331-5
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
收藏
页码：941 / 950
页数：10
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