DETERMINATION OF BORON SEGREGATION COEFFICIENT IN SILICON BY ION MICROPROBE ANALYSIS

被引:0
|
作者
COLBY, JW [1 ]
KATZ, LE [1 ]
机构
[1] BELL TEL LABS INC,ALLENTOWN,PA 18103
关键词
D O I
暂无
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:C91 / C91
页数:1
相关论文
共 50 条
  • [41] Ion beam analysis of the segregation and solubility of iridium during silicon crystallization
    Almendra, A
    Rodríguez, A
    Rodríguez, T
    Kling, A
    da Silva, MF
    Soares, JC
    Ballesteros, C
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2002, 190 : 583 - 586
  • [43] Direct imaging of boron segregation to extended defects in silicon
    Duguay, S.
    Philippe, T.
    Cristiano, F.
    Blavette, D.
    APPLIED PHYSICS LETTERS, 2010, 97 (24)
  • [44] ION CHANNELING ANALYSIS OF PRE-AMORPHIZED SILICON DIODES USING A NUCLEAR MICROPROBE
    THORNTON, J
    PAUS, KC
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1988, 3 (12) : 1196 - 1202
  • [45] NUCLEAR MICROPROBE ION-CHANNELING ANALYSIS OF TOTAL DIELECTRIC ISOLATION STRUCTURES IN SILICON
    THORNTON, J
    ROBINSON, AK
    REESON, KJ
    DAVIS, J
    HEMMENT, PLF
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1991, 6 (09) : 890 - 895
  • [46] Heavily boron-doped silicon single crystal growth: Boron segregation
    Taishi, T
    Huang, XM
    Kubota, M
    Kajigaya, T
    Fukami, T
    Hoshikawa, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1999, 38 (3A): : L223 - L225
  • [47] Boron implanted in silicon: Segregation at angular configurations of the silicon/silicon dioxide oxidation boundary
    Tarnavsky, GA
    Shpak, SI
    Obrecht, MS
    JETP LETTERS, 2001, 73 (09) : 474 - 478
  • [48] Boron implanted in silicon: Segregation at angular configurations of the silicon/silicon dioxide oxidation boundary
    G. A. Tarnavsky
    S. I. Shpak
    M. S. Obrecht
    Journal of Experimental and Theoretical Physics Letters, 2001, 73 : 474 - 478
  • [49] Application of pitzer ion interaction model in the determination of activity coefficient to natural brines with presence of boron
    Garcés I.
    Informacion Tecnologica, 2019, 30 (02): : 283 - 292
  • [50] SAMPLING ERROR IN ION MICROPROBE ANALYSIS
    SCILLA, GJ
    MORRISON, GH
    ANALYTICAL CHEMISTRY, 1977, 49 (11) : 1529 - 1536