AMORPHOUS NATURE OF VACUUM-DEPOSITED BI-SB ALLOY-FILMS

被引：5

|

作者：

INOUE, M

URAI, N

YAGI, H

机构：

来源：

SURFACE SCIENCE | 1979年 / 86卷 / JUL期

关键词：

D O I：

10.1016/0039-6028(79)90415-1

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

下载

收藏

页码：369 / 377

页数：9

相关论文

共 50 条

[1] METASTABLE STATES IN VACUUM-DEPOSITED CU-W ALLOY-FILMS
DOTSENKO, FF
MIROSHNICHENKO, IS
BASHEV, VF
INORGANIC MATERIALS, 1991, 27 (04) : 728 - 729
[2] TRANSPORT-PROPERTIES OF VACUUM-DEPOSITED TIN TELLURIUM ALLOY-FILMS
ATHWAL, IS
THAMAN, M
BEDI, RK
JOURNAL OF MATERIALS SCIENCE, 1986, 21 (09) : 3243 - 3247
[3] TRANSPORT-PROPERTIES OF VACUUM-DEPOSITED INDIUM-ANTIMONY ALLOY-FILMS
KAUR, S
BEDI, RK
MATERIALS RESEARCH BULLETIN, 1990, 25 (11) : 1421 - 1428
[4] VACUUM-DEPOSITED AMORPHOUS PHTHALEIN FILMS
MORINAKA, A
OIKAWA, S
THIN SOLID FILMS, 1984, 113 (03) : 235 - 241
[5] ELECTRICAL-PROPERTIES OF THIN BI-SB ALLOY-FILMS DOPED WITH TELLURIUM AND TIN
TAKABE, S
OSONO, H
KANEDA, S
THIN SOLID FILMS, 1986, 145 (02) : 171 - 184
[6] REPRODUCIBILITY OF VACUUM-DEPOSITED FILMS OF AMORPHOUS ZNTE
MOORE, CJ
BHARAJ, BS
BRODIE, DE
CANADIAN JOURNAL OF PHYSICS, 1981, 59 (07) : 924 - 928
[7] STRUCTURE FORMATION AND PROPERTIES OF VACUUM-DEPOSITED MULTICOMPONENT (CU-MN-NI) ALLOY-FILMS
VIGDOROVICH, VN
POPOV, VI
RUSSIAN METALLURGY, 1977, (05): : 83 - 88
[8] ANNEALING AND THICKNESS EFFECTS ON ELECTRICAL-RESISTANCE OF VACUUM-DEPOSITED TIN ANTIMONIDE ALLOY-FILMS
DAMODARADAS, V
JAGADEESH, MS
THIN SOLID FILMS, 1974, 24 (02) : 203 - 210
[9] INVESTIGATION OF VACUUM-DEPOSITED MN-BI ALLOY-FILMS USING HIGH-RESOLUTION ELECTRON-MICROSCOPY FOR A CASE OF CO-DEPOSITED FILMS
YOSHIDA, K
YAMADA, T
JOURNAL OF ELECTRON MICROSCOPY, 1985, 34 (03): : 213 - 213
[10] VACUUM-DEPOSITED FILMS OF NICKEL-CHROMIUM ALLOY
ALDERSON, RH
ASHWORTH, F
BRITISH JOURNAL OF APPLIED PHYSICS, 1957, 8 (05): : 205 - 210

← 1 2 3 4 5 →