FOCUSED ION-BEAMS IN MICROFABRICATION

被引：10

作者：

SELIGER, RL ^{[1
]}

FLEMING, WP ^{[1
]}

机构：

[1] HUGHES RES LABS,MALIBU,CA 90265

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1973年 / 10卷 / 06期

关键词：

D O I：

10.1116/1.1318486

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1127 / 1127

页数：1

共 50 条

[1] FOCUSED ION-BEAMS IN MICROFABRICATION
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[J]. JOURNAL DE PHYSIQUE, 1989, 50 (C8): : C8179 - C8190
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[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1982, 21 (01) : 3 - 10
[9] APPLICATIONS OF FOCUSED ION-BEAMS
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[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1993, 140 (01) : 183 - 188
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[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 218 (1-3): : 355 - 362