ELLIPSOMETRIC ANALYSIS OF ION-IMPLANTATION INDUCED DAMAGE LAYER AND ITS REGROWTH

被引：0
|
作者：
NAKAMAE, M [1 ]
NOJIRI, M [1 ]
TAKAHATA, K [1 ]
机构：
[1] NIPPON ELECT CO LTD,DIV INTEGRATED CIRCUIT,M53 SHIMOUNUMABE,NAKAHARO KU,KAWASAKI 211,JAPAN
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1978年 / 125卷 / 08期
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D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
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页码：C354 / C354
页数：1
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