ANALYTICAL DETERMINATION OF BORON IN CHEMICALLY DEPOSITED POLYCRYSTALLINE SILICON

被引：1
|
作者：
BRISKA, M [1 ]
KIOFSKY, A [1 ]
机构：
[1] IBM LABS,D-703 BOEBLINGEN,WEST GERMANY
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1974年 / 121卷 / 07期
关键词：
D O I：
10.1149/1.2401965
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：972 / 973
页数：2
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