STRESSES IN TASIX FILMS SPUTTER DEPOSITED ON POLYCRYSTALLINE SILICON

被引：15

作者：

TEAL, VL

MURARKA, SP

机构：

[1] RENSSELAER POLYTECH INST,DEPT MAT ENGN,TROY,NY 12180

[2] RENSSELAER POLYTECH,CTR INTEGRATED ELECTR,TROY,NY 12180

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 61卷 / 11期

关键词：

D O I：

10.1063/1.338326

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：5038 / 5046

页数：9

共 50 条

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