ANALYTICAL DETERMINATION OF BORON IN CHEMICALLY DEPOSITED POLYCRYSTALLINE SILICON

被引：1

作者：

BRISKA, M ^{[1
]}

KIOFSKY, A ^{[1
]}

机构：

[1] IBM LABS,D-703 BOEBLINGEN,WEST GERMANY

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1974年 / 121卷 / 07期

关键词：

D O I：

10.1149/1.2401965

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：972 / 973

页数：2

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