SIMPLE ION-SOURCE FOR TARGET PREPARATION VIA ION-BEAM SPUTTERING

被引：3

作者：

NOLEN, JA ^{[1
]}

CURTIN, MS ^{[1
]}

DYSON, TE ^{[1
]}

机构：

[1] MICHIGAN STATE UNIV,DEPT PHYS,E LANSING,MI 48824

来源：

NUCLEAR INSTRUMENTS & METHODS | 1978年 / 150卷 / 03期

关键词：

D O I：

10.1016/0029-554X(78)90131-3

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：581 / 583

页数：3

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