DIRECTED ION-BEAM SPUTTER ETCHING OF POLYTETRAFLUOROETHYLENE (TEFLON) USING AN ARGON ION-SOURCE

被引:14
|
作者
GARNER, CE
GABRIEL, SB
KUO, YS
机构
关键词
D O I
10.1016/0040-6090(82)90041-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:351 / 362
页数:12
相关论文
共 50 条
  • [1] REACTIVE ION-BEAM ETCHING USING A BROAD BEAM ECR ION-SOURCE
    MATSUO, S
    ADACHI, Y
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1982, 21 (01): : L4 - L6
  • [2] ARGON ION-SOURCE FOR ION ETCHING
    KUBODERA, K
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1975, 14 (10) : 1637 - 1638
  • [3] ION-BEAM ETCHING OF POLYTETRAFLUOROETHYLENE
    TORRISI, L
    FOTI, G
    [J]. JOURNAL OF MATERIALS RESEARCH, 1990, 5 (11) : 2723 - 2728
  • [4] SPUTTER TYPE HF ION-SOURCE FOR ION-BEAM DEPOSITION APPARATUS
    YAMASHITA, M
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1987, 26 (05): : 721 - 727
  • [5] ION-BEAM ETCHING OF PHOTOMASKS BY MEANS OF AN ION-SOURCE FROM A DOUBLE CATHODE
    SPANGENBERG, B
    HAMMER, K
    ROTHE, R
    PRZYBOROWSKI, F
    [J]. DOKLADI NA BOLGARSKATA AKADEMIYA NA NAUKITE, 1985, 38 (11): : 1485 - 1488
  • [6] PRODUCTION OF ION-BEAM USING PLASMA FILAMENT ION-SOURCE
    YABE, E
    FUKUI, R
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1987, 26 (07): : 1179 - 1184
  • [7] MEV HELIUM ION-BEAM ETCHING OF POLYTETRAFLUOROETHYLENE
    TORRISI, L
    CALCAGNO, L
    FOTI, AM
    [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1988, 32 (1-4): : 142 - 144
  • [8] SOME CHARACTERISTICS OF MULTIPLY CHARGED ARGON ION-BEAM DELIVERED BY TRIPLEMAFIOS ION-SOURCE
    BEX, L
    BRIAND, P
    DEBERNARDI, J
    CHANTUNG, N
    GELLER, R
    JACQUOT, B
    [J]. COMPTES RENDUS HEBDOMADAIRES DES SEANCES DE L ACADEMIE DES SCIENCES SERIE B, 1976, 283 (14): : 393 - 396
  • [9] REACTIVE ION-BEAM ETCHING OF SILICON-COMPOUNDS WITH A SADDLE-FIELD ION-SOURCE
    REVELL, PJ
    GOLDSPINK, GF
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1398 - 1402
  • [10] ION-BEAM SELF-SPUTTERING USING A CATHODIC ARC ION-SOURCE
    SANDERS, DM
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (03): : 1929 - 1933