ONSET OF DEFECTS IN N+ SILICON-DOPED GAAS

被引:0
|
作者
URE, JW [1 ]
STIRLAND, DJ [1 ]
AUGUSTUS, PD [1 ]
DAVIS, R [1 ]
机构
[1] PLESSEY CO LTD,ALLEN CLARK RES CTR,TOWCHESTER NN12 8EQ,NORTHAMPTONSHIR,ENGLAND
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:711 / 712
页数:2
相关论文
共 50 条
  • [21] Lifetime studies of self-activated photoluminescence in heavily silicon-doped GaAs
    Sauncy, T
    Palsule, CP
    Holtz, M
    Gangopadhyay, S
    Massie, S
    PHYSICAL REVIEW B, 1996, 53 (04): : 1900 - 1906
  • [23] CATHODOLUMINESCENCE SPECTROMETRY FOR INSPECTION OF SILICON-DOPED GAAS LIGHT-EMITTING-DIODES
    KNAUER, U
    WOLFGANG, E
    SIEMENS FORSCHUNGS-UND ENTWICKLUNGSBERICHTE-SIEMENS RESEARCH AND DEVELOPMENT REPORTS, 1977, 6 (04): : 236 - 244
  • [24] EFFECT OF PRESSURE ON DEFECT-RELATED EMISSION IN HEAVILY SILICON-DOPED GAAS
    HOLTZ, M
    SAUNCY, T
    DALLAS, T
    MASSIE, S
    PHYSICAL REVIEW B, 1994, 50 (19): : 14706 - 14709
  • [25] CONVERSION OF TYPE OF CONDUCTION STIMULATED BY ION-BOMBARDMENT OF SILICON-DOPED GAAS
    ZELEVINSKAYA, VM
    KACHURIN, GA
    SAFRONOV, LN
    SMIRNOV, LS
    SOVIET PHYSICS SEMICONDUCTORS-USSR, 1976, 10 (01): : 99 - 99
  • [26] Two-Photon Spin-Polarization Spectroscopy in Silicon-Doped GaAs
    Miah, M. Idrish
    JOURNAL OF PHYSICAL CHEMISTRY B, 2009, 113 (19): : 6800 - 6802
  • [27] LOCAL-MODE ABSORPTION AND DEFECTS IN COMPENSATED SILICON-DOPED GALLIUM ARSENIDE
    SPITZER, WG
    ALLRED, W
    JOURNAL OF APPLIED PHYSICS, 1968, 39 (11) : 4999 - &
  • [28] ION BEAM AND SIMS ANALYSIS ON DAMAGE OF GaAs DOPED WITH N+
    吴小山
    林振金
    姬成周
    杨锡震
    Nuclear Science and Techniques, 1994, (03) : 154 - 161
  • [29] Asymptotic diffuse X-ray scattering by silicon-doped GaAs single crystals
    Lomov, AA
    Bushuev, VA
    Imamov, RM
    Bocchi, C
    Franzosi, P
    CRYSTALLOGRAPHY REPORTS, 1999, 44 (04) : 626 - 634
  • [30] POROUS SILICON FORMATION IN N-/N+/N- DOPED STRUCTURES
    TSAO, SS
    GUILINGER, TR
    KELLY, MJ
    KAUSHIK, VS
    DATYE, AK
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1991, 138 (06) : 1739 - 1743