INTRODUCTION OF HYDROGEN IN SIO2-FILMS BY EXPOSURE TO A HYDROGEN PLASMA

被引：0
|
作者：
STEIN, HJ [1 ]
PEERCY, PS [1 ]
机构：
[1] SANDIA NATL LABS,ALBUQUERQUE,NM 87185
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1982年 / 129卷 / 08期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
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页码：C328 / C328
页数：1
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