INTRODUCTION OF HYDROGEN IN SIO2-FILMS BY EXPOSURE TO A HYDROGEN PLASMA

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作者
STEIN, HJ [1 ]
PEERCY, PS [1 ]
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[1] SANDIA NATL LABS,ALBUQUERQUE,NM 87185
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O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:C328 / C328
页数:1
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