DESIGN OF A VARIABLE-APERTURE PROJECTION AND SCANNING SYSTEM FOR ELECTRON-BEAM

被引：43
|
作者：
GOTO, E
SOMA, T
IDESAWA, M
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 03期
关键词：
Compendex;
D O I：
10.1116/1.569620
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
ELECTRON OPTICS
引用
收藏
页码：883 / 886
页数：4
相关论文
共 50 条
  • [41] ELECTRON-BEAM LITHOGRAPHY WITH THE SCANNING TUNNELING MICROSCOPE
    MARRIAN, CRK
    DOBISZ, EA
    DAGATA, JA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (06): : 2877 - 2881
  • [42] SCANNING ELECTRON-BEAM PROBES VLSI CHIPS
    FAZEKAS, P
    FEUERBAUM, HP
    WOLFGANG, E
    ELECTRONICS, 1981, 54 (14): : 105 - 112
  • [43] DISTORTION CORRECTION IN SCANNING ELECTRON-BEAM SYSTEMS
    VISWANATHAN, R
    CHANG, THP
    COFFEY, D
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (03) : C157 - C157
  • [44] DEFLECTION DISTORTION IN SCANNING ELECTRON-BEAM SYSTEMS
    CHANG, THP
    VISWANATHAN, R
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 878 - 882
  • [45] PROGRAMMED SCANNING OF AN ELECTRON-BEAM FOR WELDING AND MACHINING
    TOMSON, TI
    NAZARENKO, OK
    WELDING PRODUCTION, 1974, 21 (03): : 77 - 78
  • [46] SCANNING ELECTRON-BEAM ANNEALING WITH A MODIFIED SEM
    RATNAKUMAR, KN
    PEASE, RFW
    BARTELINK, DJ
    JOHNSON, NM
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1843 - 1846
  • [47] Mechanical modeling of projection electron-beam lithography masks
    Univ of Wisconsin-Madison, Stoughton, United States
    Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, 12 B (7564-7569):
  • [48] Proximity effect correction in projection electron beam lithography (scattering with angular limitation projection electron-beam lithography)
    Liddle, JA
    Watson, GP
    Berger, SD
    Miller, PD
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (12B): : 6672 - 6678
  • [49] Proximity effect correction in projection electron beam lithography (scattering with angular limitation projection electron-beam lithography)
    Liddle, J.Alexander
    Watson, G.Patrick
    Berger, Steven D.
    Miller, Peter D.
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1995, 34 (12 B): : 6672 - 6678
  • [50] DESIGN OF FAST DEFLECTION COILS FOR AN ELECTRON-BEAM MICROFABRICATION SYSTEM
    AMBOSS, K
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1152 - 1155
12345