DISTORTION CORRECTION IN SCANNING ELECTRON-BEAM SYSTEMS

被引:0
|
作者
VISWANATHAN, R [1 ]
CHANG, THP [1 ]
COFFEY, D [1 ]
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
关键词
D O I
暂无
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:C157 / C157
页数:1
相关论文
共 50 条
  • [1] DEFLECTION DISTORTION IN SCANNING ELECTRON-BEAM SYSTEMS
    CHANG, THP
    VISWANATHAN, R
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 878 - 882
  • [2] CORRECTION OF NONLINEAR DISTORTION IN FAST ELECTRON-BEAM TUBES
    VARESHKIN, GL
    RABINOVICH, SG
    MEASUREMENT TECHNIQUES USSR, 1988, 31 (07): : 696 - 698
  • [3] DYNAMIC ABERRATION CORRECTION IN A COMBINED SCANNING ELECTRON-BEAM SYSTEM
    XIMEN, JY
    LI, Y
    OPTIK, 1982, 62 (03): : 287 - 297
  • [4] A SCANNING ELECTRON-BEAM ANNEALER WITH ELECTROSTATIC DEFLECTION SYSTEMS
    HART, MJ
    EVANS, AGR
    JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1985, 18 (04): : 303 - 306
  • [5] CORRECTION OF NONLINEAR DEFLECTION DISTORTION IN A DIRECT EXPOSURE ELECTRON-BEAM SYSTEM
    ENGELKE, H
    LOUGHRAN, JF
    MICHAIL, MS
    RYAN, PM
    IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1977, 21 (06) : 506 - 513
  • [6] COMPARISONS OF ACCEPTANCE AND CALIBRATION OF A SCANNING ELECTRON-BEAM AND A SCATTERED ELECTRON-BEAM
    SWEENEY, LE
    JONES, D
    MEDICAL PHYSICS, 1985, 12 (04) : 533 - 533
  • [7] SCANNING ELECTRON-BEAM ANNEALING SYSTEM
    MCMAHON, RA
    AHMED, H
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (08) : C364 - C364
  • [8] SCANNING ELECTRON-BEAM PROCESSING OF DEVICES
    MCMAHON, RA
    SPEIGHT, JD
    AHMED, H
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (08) : C364 - C364
  • [9] IMPLANTATION ANNEALING WITH A SCANNING ELECTRON-BEAM
    JAUSSAUD, C
    BIASSE, B
    CARTIER, AM
    BONTEMPS, A
    JOURNAL DE PHYSIQUE, 1983, 44 (NC-5): : 303 - 306
  • [10] ABERRATION CORRECTION FOR INCREASED LINES PER FIELD IN SCANNING ELECTRON-BEAM TECHNOLOGY
    OWEN, G
    NIXON, WC
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (06): : 983 - 986