TEMPERATURE-COMPENSATION CIRCUIT TECHNIQUES FOR HIGH-DENSITY CMOS DRAMS

被引:0
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作者
MIN, DS
CHO, S
JUN, DS
LEE, DJ
SEOK, YS
CHIN, DJ
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TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents novel temperature-compensation circuit techniques for the CMOS DRAM internal voltage converter, the RC-delay circuit, and the back-bias generator, which do not need any additional process steps. The above-mentioned circuits have been designed and evaluated through a 16-Mb CMOS DRAM. These circuits have shown an internal voltage converter (IVC) with an internal voltage temperature coefficient of 185 ppm/degrees-C, and an RC-delay circuit with a delay time temperature coefficient of 0.03%/degrees-C. As a result, 6.5-ns faster RAS access time and improved latch-up immunity have been achieved, compared with conventional circuit techniques.
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页码:524 / 529
页数:6
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