CHARACTERIZATION OF LOW-PRESSURE CHEMICAL VAPOR-DEPOSITED AND THERMALLY GROWN SILICON-NITRIDE FILMS

被引：69

作者：

HABRAKEN, FHPM ^{[1
]}

KUIPER, AET ^{[1
]}

VANOOSTROM, A ^{[1
]}

TAMMINGA, Y ^{[1
]}

THEETEN, JB ^{[1
]}

机构：

[1] LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE

来源：

JOURNAL OF APPLIED PHYSICS | 1982年 / 53卷 / 01期

关键词：

D O I：

10.1063/1.329902

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：404 / 415

页数：12

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