CHARACTERIZATION OF LOW-PRESSURE CHEMICAL VAPOR-DEPOSITED AND THERMALLY GROWN SILICON-NITRIDE FILMS

被引：69
|
作者：
HABRAKEN, FHPM [1 ]
KUIPER, AET [1 ]
VANOOSTROM, A [1 ]
TAMMINGA, Y [1 ]
THEETEN, JB [1 ]
机构：
[1] LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
来源：
JOURNAL OF APPLIED PHYSICS | 1982年 / 53卷 / 01期
关键词：
D O I：
10.1063/1.329902
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：404 / 415
页数：12
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