ADVANCES IN PLASMA-ETCHING

被引：0
|
作者：
FLAMM, DL
机构：
来源：
SOLID STATE TECHNOLOGY | 1991年 / 34卷 / 04期
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：105 / 105
页数：1
相关论文
共 50 条
  • [21] DOWNSTREAM PLASMA-ETCHING AND STRIPPING
    COOK, JM
    SOLID STATE TECHNOLOGY, 1987, 30 (04) : 147 - 151
  • [22] A GENERALIZED PLASMA-ETCHING MODEL
    ZAWAIDEH, E
    KIM, NS
    JOURNAL OF APPLIED PHYSICS, 1988, 64 (08) : 4199 - 4207
  • [23] PLASMA-ETCHING OF LPCVD TUNGSTEN
    CHERN, GC
    HA, C
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (06) : C226 - C226
  • [24] PLASMA-ETCHING - DISCUSSION OF MECHANISMS
    COBURN, JW
    WINTERS, HF
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 391 - 403
  • [25] PLASMA-ETCHING OF INORGANIC RESISTS
    CHANG, MS
    CHEN, JT
    JOURNAL OF ELECTRONIC MATERIALS, 1979, 8 (05) : 727 - 727
  • [26] SUBSTRATE BIASING FOR PLASMA-ETCHING
    MANTEI, TD
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (09) : 1958 - 1959
  • [27] DENSE RF PLASMA-ETCHING
    BOUCHOULE, A
    HENRY, D
    LAURE, C
    RANSON, P
    SALAH, D
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (08) : C310 - C310
  • [28] PLASMA-ETCHING WITH MAGNETIC CONFINEMENT
    WICKER, TE
    MANTEI, TD
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (03) : C86 - C86
  • [29] PHOTON ASSISTED PLASMA-ETCHING
    HOLBER, WM
    OSGOOD, RM
    SOLID STATE TECHNOLOGY, 1987, 30 (04) : 139 - 143
  • [30] SPECTROSCOPIC ANALYSIS OF PLASMA-ETCHING
    VALYI, G
    SCHILLER, V
    SZABO, I
    ACTA PHYSICA ACADEMIAE SCIENTIARUM HUNGARICAE, 1980, 49 (1-3): : 167 - 167
12345