SOME INVESTIGATION OF SI AND SIO2 SURFACES ETCHED IN CF4 OR CF4-O2 PLASMA

被引：5
|
作者：
ATANASOVA, ED
KIROV, KI
PANTCHEV, BG
GEORGIEV, SS
机构：
来源：
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1980年 / 59卷 / 02期
关键词：
D O I：
10.1002/pssa.2210590253
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：853 / 859
页数：7
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