DEGRADATION OF POLY(METHYL METHACRYLATE) IN CF4 AND CF4/O2 PLASMAS.

被引:0
|
作者
Wu, B.J. [1 ]
Hess, D.W. [1 ]
Soong, D.S. [1 ]
Bell, A.T. [1 ]
机构
[1] Department of Chemical Engineering, University of California, Berkeley, CA 94720, United States
来源
| 1725年 / 54期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] DEGRADATION OF POLY(METHYL METHACRYLATE) IN CF4 AND CF4/O2 PLASMAS
    WU, BJ
    HESS, DW
    SOONG, DS
    BELL, AT
    JOURNAL OF APPLIED PHYSICS, 1983, 54 (04) : 1725 - 1729
  • [2] MODELING OF SILICON ETCHING IN CF4/O2 AND CF4/H2 PLASMAS
    VENKATESAN, SP
    TRACHTENBERG, I
    EDGAR, TF
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (07) : 2280 - 2290
  • [3] EFFECTS OF O2, AIR, AND CF4 PLASMAS ON POLY(ETHERKETONE) SURFACES
    ONYIRIUKA, EC
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (06): : 2941 - 2944
  • [4] POLYIMIDE ETCHING IN O2/CF4 RF PLASMAS
    YOGI, T
    SAENGER, K
    PURUSHOTHAMAN, S
    SUN, CP
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (11) : C471 - C471
  • [5] Quantitative Analysis of Mass Spectrometric Signals for the Estimation of Fluorine Radical Densities in CF4 and CF4/O2 Plasmas
    Jie Li
    Yongjae Kim
    Seunghun Han
    Jingjie Niu
    Heeyeop Chae
    Plasma Chemistry and Plasma Processing, 2022, 42 : 989 - 1002
  • [6] Quantitative Analysis of Mass Spectrometric Signals for the Estimation of Fluorine Radical Densities in CF4 and CF4/O2 Plasmas
    Li, Jie
    Kim, Yongjae
    Han, Seunghun
    Niu, Jingjie
    Chae, Heeyeop
    PLASMA CHEMISTRY AND PLASMA PROCESSING, 2022, 42 (04) : 989 - 1002
  • [7] Mass spectrometric studies of ionic products in CF4/He and CF4/O2/He microwave discharge plasmas
    Iwase, K
    Selvin, PC
    Sato, G
    Fujii, T
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2002, 35 (16) : 1934 - 1938
  • [8] KINETIC MODELING OF POLYMER ETCHING IN CF4/O2 PLASMAS
    REMBETSKI, JF
    BABU, SV
    LU, NH
    HOFFARTH, JG
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (08) : C309 - C310
  • [9] ETCHING BEHAVIOR OF AN EPOXY FILM IN O2/CF4 PLASMAS
    EMMI, F
    EGITTO, FD
    MATIENZO, LJ
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (03): : 786 - 789
  • [10] Novel technique to pattern silver using CF4 and CF4/O2 glow discharges
    Nguyen, P
    Zeng, YX
    Alford, TL
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (01): : 158 - 165