LOW-TEMPERATURE MIGRATION OF SILICON THROUGH METAL FILMS IMPORTANCE OF SILICON-METAL INTERFACE

被引：69
|
作者：
HIRAKI, A
LUGUJJO, E
NICOLET, MA
MAYER, JW
机构：
来源：
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1971年 / 7卷 / 02期
关键词：
D O I：
10.1002/pssa.2210070212
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
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页码：401 / &
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