PROJECTION LITHOGRAPHY WITH HIGH NUMERICAL APERTURE OPTICS

被引：0
|
作者：
OLDHAM, WG [1 ]
NEUREUTHER, AR [1 ]
机构：
[1] UNIV CALIF BERKELEY,ELECTR RES LAB,BERKELEY,CA 94720
来源：
SOLID STATE TECHNOLOGY | 1981年 / 24卷 / 05期
关键词：
Compendex;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
LITHOGRAPHY
引用
收藏
页码：106 / &
相关论文
共 50 条
  • [31] 157-nm Chromeless Phase Lithography with extremely high numerical aperture
    Watanabe, K
    Hagiwara, T
    Matsuura, S
    Suganaga, T
    Itani, T
    Fujii, K
    OPTICAL MICROLITHOGRAPHY XVII, PTS 1-3, 2004, 5377 : 537 - 544
  • [32] Plasmonic direct-writing lithography via high numerical aperture objectives
    Jiang, Zhongjun
    He, Wei
    Chen, Jingwei
    Jiang, Kai
    Li, Shuaichao
    Wang, Liang
    OPTICS LETTERS, 2023, 48 (15) : 4153 - 4156
  • [33] Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks
    Wood, Obert
    Raghunathan, Sudhar
    Mangat, Pawitter
    Philipsen, Vicky
    Luong, Vu
    Kearney, Patrick
    Verduijn, Erik
    Kumar, Aditya
    Patil, Suraj
    Laubis, Christian
    Soltwisch, Victor
    Scholze, Frank
    EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY VI, 2015, 9422
  • [34] Effect of high numerical aperture lens on lithographic performance in 157 nm lithography
    Itani, T
    Suganaga, T
    Kanda, N
    Kim, JH
    Watanabe, K
    Cashmore, J
    Gower, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (06): : 2562 - 2566
  • [35] An aberration control of projection optics for multi-patterning lithography
    Ohmura, Yasuhiro
    Ogata, Taro
    Hirayama, Toru
    Nishinaga, Hisashi
    Shiota, Takeshi
    Ishiyama, Satoshi
    Isago, Susumu
    Kawahara, Hidetaka
    Matsuyama, Tomoyuki
    OPTICAL MICROLITHOGRAPHY XXIV, 2011, 7973
  • [36] OUTLINE AND TEST OF A CORRECTED PROJECTION OPTICS SYSTEM FOR ELECTRON LITHOGRAPHY
    ANGER, K
    FROSIEN, J
    LISCHKE, B
    MIKROSKOPIE, 1980, 36 (9-10) : 302 - 302
  • [37] Study on contamination of projection optics surface for extreme ultraviolet lithography
    Koida, Keigo
    Niibe, Masahito
    APPLIED SURFACE SCIENCE, 2009, 256 (04) : 1171 - 1175
  • [38] Keystone error analysis of projection optics in a maskless lithography system
    Dong Won Kang
    Minwook Kang
    Jae Won Hahn
    International Journal of Precision Engineering and Manufacturing, 2015, 16 : 373 - 378
  • [39] DESIGN AND ANALYSIS OF DIFFRACTION MIRROR OPTICS FOR EUV PROJECTION LITHOGRAPHY
    FUKUDA, H
    TERASAWA, T
    MICROELECTRONIC ENGINEERING, 1995, 27 (1-4) : 239 - 242
  • [40] Keystone Error Analysis of Projection Optics in a Maskless Lithography System
    Kang, Dong Won
    Kang, Minwook
    Hahn, Jae Won
    INTERNATIONAL JOURNAL OF PRECISION ENGINEERING AND MANUFACTURING, 2015, 16 (02) : 373 - 378
12345