RHEED INTENSITY OSCILLATIONS DURING EPITAXIAL-GROWTH OF FCC FE ON CU(001)

被引：14

作者：

SCHATZ, A ^{[1
]}

DUNKHORST, S ^{[1
]}

LINGNAU, S ^{[1
]}

VONHORSTEN, U ^{[1
]}

KEUNE, W ^{[1
]}

机构：

[1] UNIV DUISBURG,ANGEW PHYS LAB,D-47048 DUISBURG,GERMANY

来源：

SURFACE SCIENCE | 1994年 / 310卷 / 1-3期

关键词：

D O I：

10.1016/0039-6028(94)91357-9

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Up to 14 strong intensity oscillations of the specular beam in reflection high-energy electron diffraction (RHEED) have been observed during the epitaxial growth of face-centered (fcc) Fe on Cu(001) in the temperature range between 333-370 K. The amplitudes of these oscillations are strong even in the initial stages of growth. This provides evidence that the hetero-epitaxial growth of fcc Fe on Cu(001) proceeds predominantly layer-by-layer-like in that temperature regime. For growth at 300 K, initial Fe-bilayer-island formation followed by predominant layer-by-layer growth above 2 monolayers (ML) of Fe is observed. 3D growth prevails at approximately 100 K.

引用

页码：L595 / L600

页数：6

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