RHEED INTENSITY OSCILLATIONS DURING EPITAXIAL-GROWTH OF FCC FE ON CU(001)

被引:14
|
作者
SCHATZ, A [1 ]
DUNKHORST, S [1 ]
LINGNAU, S [1 ]
VONHORSTEN, U [1 ]
KEUNE, W [1 ]
机构
[1] UNIV DUISBURG,ANGEW PHYS LAB,D-47048 DUISBURG,GERMANY
关键词
D O I
10.1016/0039-6028(94)91357-9
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Up to 14 strong intensity oscillations of the specular beam in reflection high-energy electron diffraction (RHEED) have been observed during the epitaxial growth of face-centered (fcc) Fe on Cu(001) in the temperature range between 333-370 K. The amplitudes of these oscillations are strong even in the initial stages of growth. This provides evidence that the hetero-epitaxial growth of fcc Fe on Cu(001) proceeds predominantly layer-by-layer-like in that temperature regime. For growth at 300 K, initial Fe-bilayer-island formation followed by predominant layer-by-layer growth above 2 monolayers (ML) of Fe is observed. 3D growth prevails at approximately 100 K.
引用
收藏
页码:L595 / L600
页数:6
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