STRUCTURAL AND ELECTRONIC-PROPERTIES OF CVD SILICON FILMS NEAR THE CRYSTALLIZATION TEMPERATURE

被引：6
|
作者：
MAGARINO, J
KAPLAN, D
BISARO, R
MORHANGE, JF
ZELLAMA, K
机构：
[1] UNIV PARIS 06,PHYS SOLIDES LAB,F-75230 PARIS 05,FRANCE
[2] UNIV PARIS 07,ECOLE NORM SUPER,PHYS SOLIDES GRP,F-75221 PARIS 05,FRANCE
来源：
JOURNAL DE PHYSIQUE | 1982年 / 43卷 / NC1期
关键词：
D O I：
10.1051/jphyscol:1982137
中图分类号：
学科分类号：
摘要：
引用
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页码：271 / 276
页数：6
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