PROFILES OF HIGH CONDUCTIVITY SHALLOW LAYERS IN SILICON PRODUCED BY BORON ION IMPLANTATION

被引：6
|
作者：
LARGE, LN
HILL, H
BALL, MP
机构：
来源：
INTERNATIONAL JOURNAL OF ELECTRONICS | 1967年 / 22卷 / 02期
关键词：
D O I：
10.1080/00207216708937951
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
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页码：153 / &
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