OPTIMIZATION OF SUBMICRON POLYSILICON ETCHING AND THE EFFECT OF ORGANIC AND INORGANIC MASKS, AND THEIR ASPECT RATIOS

被引：1
|
作者：
PENG, S
CHEN, DC
LIU, ED
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 07期
关键词：
D O I：
10.1149/1.2108939
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
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页码：1479 / 1484
页数：6
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