CONTACT TECHNOLOGIES IN SUB-MICRON ULSIS

被引：0
|
作者：
KASHIWAGI, M [1 ]
KUNISHIMA, I [1 ]
SUGURO, K [1 ]
机构：
[1] TOSHIBA CORP,VLSI RES CTR,SIWAI KU,KAWASAKI 210,JAPAN
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 03期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C133 / C133
页数：1
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