DIAMOND CRYSTAL-GROWTH BY PLASMA CHEMICAL VAPOR-DEPOSITION

被引：164
|
作者：
CHANG, CP
FLAMM, DL
IBBOTSON, DE
MUCHA, JA
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1988年 / 63卷 / 05期
关键词：
D O I：
10.1063/1.339912
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：1744 / 1748
页数：5
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