GROWTH OF DIAMOND BY RF PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION

被引：14

作者：

MEYER, DE ^{[1
]}

IANNO, NJ ^{[1
]}

WOOLLAM, JA ^{[1
]}

SWARTZLANDER, AB ^{[1
]}

NELSON, AJ ^{[1
]}

机构：

[1] SOLAR ENERGY RES INST,GOLDEN,CO 80401

来源：

JOURNAL OF MATERIALS RESEARCH | 1988年 / 3卷 / 06期

关键词：

D O I：

10.1557/JMR.1988.1397

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：1397 / 1403

页数：7

共 50 条

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