FUNDAMENTAL-STUDIES OF THE INTERPROXIMITY EFFECT IN ELECTRON-BEAM LITHOGRAPHY

被引：10
|
作者：
NOMURA, E
MURATA, K
NAGAMI, K
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 1979年 / 18卷 / 07期
关键词：
D O I：
10.1143/JJAP.18.1353
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：1353 / 1360
页数：8
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