LATERALLY GRADED DIVISION PARAMETER LAYERED SYNTHETIC MICROSTRUCTURES

A laterally graded gamma layered synthetic microstructure (LSM), (where the division parameter gamma is the ratio between the thickness of the high refractive index material and the LSM's period), has been manufactured by means of a sputtering technique. This special LSM has been characterized by specular reflectivity X-ray measurements using a diffractometer equipped with an incident beam monochromator and Cu-K alpha, (1.5418 Angstrom) radiation. It exhibits the properties expected by the dynamical theory of X-ray diffraction. The results are shown to be in good agreement with computer simulations and transmission electron microscopy (TEM) observations. The object of this paper is to prove the feasibility of such a structure whose the interest is the selection on one sample of the division parameter gamma desired for different applications. We give a calibration curve of the sample by means of an experimental law of laterally gamma variation.