FABRICATION AND APPLICATIONS OF WHOLE-WAFER NB AL2O3 NB TUNNEL-JUNCTIONS

被引：0
|
作者：
BLAMIRE, MG
机构：
来源：
INSTITUTE OF PHYSICS CONFERENCE SERIES | 1990年 / 111期
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D O I：
暂无
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
Progressive development of the precision and reliability of processing technology has allowed the fabrication of complex device structures for a wide range of different applications. This review paper discusses these applications in the context of the materials science and physics of the devices themselves. It will be shown that by extending the current technology, and improving the already precise deposition techniques, a number of novel devices may be developed.
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页码：285 / 294
页数：10
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