共 50 条
- [21] Comparison of models for silicon etching in CF4 + O2 plasma VACUUM, 2012, 86 (12) : 1964 - 1968
- [22] Etching Mechanisms and Surface Conditions for SiOxNy Thin Films in CF4 + CHF3 + O2 Inductively Coupled Plasma Plasma Chemistry and Plasma Processing, 2019, 39 : 1127 - 1144
- [26] TEXTURING OF POLYIMIDE FILMS DURING O-2/CF4 SPUTTER ETCHING JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03): : 1712 - 1718
- [27] Smoothing of the Si surface using CF4/O2 down-flow etching Journal of Applied Physics, 1993, 74 (02):
- [29] Surface modification of PMMA IOL by CF4/O2RF-plasma CHEMICAL JOURNAL OF CHINESE UNIVERSITIES-CHINESE, 2008, 29 (09): : 1854 - 1858
- [30] Low-pressure plasma-etching of bulk polymer materials using gas mixture of CF4 and O2 AIP ADVANCES, 2013, 3 (11):