INFLUENCE OF AU OVERLAYERS ON VALENCE-BAND OFFSETS FOR BURIED CAF2/SI(111) INTERFACES

被引:12
|
作者
XU, F
VOS, M
WEAVER, JH
机构
来源
PHYSICAL REVIEW B | 1989年 / 39卷 / 11期
关键词
D O I
10.1103/PhysRevB.39.8008
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
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页码:8008 / 8011
页数:4
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