DIAGNOSTICS OF FILM GROWTH IN PLASMA CHEMICAL VAPOR-DEPOSITION

被引：6

|

作者：

KNIGHTS, JC

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.575601

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

收藏

页码：2060 / 2060

页数：1

相关论文

共 50 条

[31] THIN-FILM PREPARATION BY CHEMICAL VAPOR-DEPOSITION
HAMMOND, ML
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (01): : 268 - &
[32] CHEMICAL VAPOR-DEPOSITION OF THIN-FILM PLATINUM
RAND, MJ
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (05) : 686 - 693
[33] CHEMICAL VAPOR-DEPOSITION OF THIN-FILM PLATINUM
RAND, MJ
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (08) : C238 - &
[34] CHEMICAL VAPOR-DEPOSITION
HIROSE, M
SEMICONDUCTORS AND SEMIMETALS, 1984, 21 : 109 - 122
[35] CHEMICAL VAPOR-DEPOSITION
JENSEN, KF
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1986, 192 : 5 - IAEC
[36] CHEMICAL VAPOR-DEPOSITION
JENSEN, KF
ADVANCES IN CHEMISTRY SERIES, 1989, (221): : 199 - 263
[37] CHEMICAL VAPOR-DEPOSITION
ARCHER, NJ
PHYSICS IN TECHNOLOGY, 1979, 10 (04): : 152 - 161
[38] GROWTH OF DIAMOND THIN-FILMS BY DC PLASMA CHEMICAL VAPOR-DEPOSITION
SUZUKI, K
SAWABE, A
YASUDA, H
INUZUKA, T
APPLIED PHYSICS LETTERS, 1987, 50 (12) : 728 - 729
[39] CHARACTERIZATIONS OF THE DC DISCHARGE PLASMA DURING CHEMICAL VAPOR-DEPOSITION FOR DIAMOND GROWTH
SUZUKI, K
SAWABE, A
INUZUKA, T
APPLIED PHYSICS LETTERS, 1988, 53 (19) : 1818 - 1819
[40] DIAMOND GROWTH ON SILICON-NITRIDE BY MICROWAVE PLASMA CHEMICAL VAPOR-DEPOSITION
SALVADORI, MC
AGER, JW
BROWN, IG
DIAMOND AND RELATED MATERIALS, 1992, 1 (07) : 818 - 823

← 1 2 3 4 5 →