DIAGNOSTICS OF FILM GROWTH IN PLASMA CHEMICAL VAPOR-DEPOSITION

被引：6
|
作者：
KNIGHTS, JC
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期
关键词：
D O I：
10.1116/1.575601
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：2060 / 2060
页数：1
相关论文
共 50 条
  • [1] TIN FILM FORMATION BY PLASMA CHEMICAL VAPOR-DEPOSITION AND ITS PLASMA DIAGNOSTICS
    ISHII, Y
    OHTSU, H
    ADACHI, T
    ICHIMURA, H
    KOBAYASHI, K
    SURFACE & COATINGS TECHNOLOGY, 1991, 49 (1-3): : 279 - 283
  • [2] OPTICAL DIAGNOSTICS OF CHEMICAL VAPOR-DEPOSITION
    HO, P
    BREILAND, WG
    BUSS, RJ
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1992, 203 : 142 - ANYL
  • [3] INCREASE IN NUCLEATION DENSITY OF DIAMOND FILM GROWTH BY DC PLASMA CHEMICAL VAPOR-DEPOSITION
    HIBINO, Y
    HAYASHI, Y
    SURFACE & COATINGS TECHNOLOGY, 1992, 55 (1-3): : 365 - 367
  • [4] SMOOTH DIAMOND FILM DEPOSITION BY AC DISCHARGE PLASMA CHEMICAL VAPOR-DEPOSITION
    CHOI, SY
    ZHANG, CJ
    LEE, GS
    THIN SOLID FILMS, 1991, 206 (1-2) : 204 - 207
  • [5] GROWTH OF DIAMOND FILMS BY MICROWAVE PLASMA CHEMICAL VAPOR-DEPOSITION
    GAO, KL
    WANG, CL
    ZHAN, RJ
    PENG, DK
    MENG, GY
    XIANG, ZL
    CHINESE PHYSICS LETTERS, 1991, 8 (07) : 348 - 351
  • [6] DIAMOND CRYSTAL-GROWTH BY PLASMA CHEMICAL VAPOR-DEPOSITION
    CHANG, CP
    FLAMM, DL
    IBBOTSON, DE
    MUCHA, JA
    JOURNAL OF APPLIED PHYSICS, 1988, 63 (05) : 1744 - 1748
  • [7] GROWTH OF MICROCRYSTAL SILICON BY REMOTE PLASMA CHEMICAL VAPOR-DEPOSITION
    KIM, SC
    JUNG, MH
    JANG, J
    APPLIED PHYSICS LETTERS, 1991, 58 (03) : 281 - 283
  • [8] PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION
    GRAVES, DB
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (02) : C38 - C38
  • [9] PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION
    HESS, DW
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1986, 192 : 9 - IAEC
  • [10] EFFECT OF UV IRRADIATION OF THE FILM DURING PLASMA CHEMICAL VAPOR-DEPOSITION
    WROBEL, AM
    CZEREMUSZKIN, G
    THIN SOLID FILMS, 1992, 216 (02) : 203 - 210
12345