RUTHERFORD BACKSCATTERING AND TRANSMISSION ELECTRON-MICROSCOPY STUDY ON PHASE-TRANSFORMATION OF AS HEAVILY DOPED SI DURING POST-RAPID-THERMAL ANNEALING

被引：2
|
作者：
LU, ZH
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 05期
关键词：
D O I：
10.1063/1.339853
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：1756 / 1760
页数：5
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