RUTHERFORD BACKSCATTERING AND TRANSMISSION ELECTRON-MICROSCOPY STUDY ON PHASE-TRANSFORMATION OF AS HEAVILY DOPED SI DURING POST-RAPID-THERMAL ANNEALING

被引：2

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作者：

LU, ZH

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来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 05期

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D O I：

10.1063/1.339853

中图分类号：

O59 [应用物理学];

学科分类号：

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页码：1756 / 1760

页数：5

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