PULSED ELECTRON-BEAM ANNEALING OF SPUTTERED AMORPHOUS SI-H FILMS

被引：1
|
作者：
TARDY, J
BARBIER, D
CACHARD, A
LAUGIER, A
FONTENILLE, J
机构：
[1] INST NATL SCI APPL,PHYS MAT LAB,F-69100 VILLEURBANNE,FRANCE
[2] CEN,DEPT RECH FONDAMENTALE,F-38041 GRENOBLE,FRANCE
来源：
MATERIALS RESEARCH BULLETIN | 1981年 / 16卷 / 03期
关键词：
D O I：
10.1016/0025-5408(81)90052-0
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：347 / 352
页数：6
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