DISTRIBUTION OF ION-BOMBARDMENT IMPLANTED KR-85 IN SI, CU, AND SIO2

被引：2
|
作者：
LUKAC, P [1 ]
JESENAK, V [1 ]
机构：
[1] SLOVAK UNIV TECHNOL BRATISLAVA, DEPT CHEM TECHNOL SILICATES, CS-88037 BRATISLAVA, CZECHOSLOVAKIA
来源：
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 1979年 / 55卷 / 02期
关键词：
D O I：
10.1002/pssa.2210550236
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：647 / 652
页数：6
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